Description
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The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP. In September 1992, AMAT announced its latest generation single-wafer, multichamber platform, the Centura, to target the high temperature thin films market as well as future process applications with 0.5 micron and below specifications.Documents
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APPLIED MATERIALS (AMAT)
CENTURA
Verified
CATEGORY
Dry Etch
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
96483
Wafer Sizes:
Unknown
Vintage:
2003
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APPLIED MATERIALS (AMAT)
CENTURA
Verified
CATEGORY
Dry Etch
Last Verified: 13 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
96483
Wafer Sizes:
Unknown
Vintage:
2003
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
No ConfigurationOEM Model Description
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP. In September 1992, AMAT announced its latest generation single-wafer, multichamber platform, the Centura, to target the high temperature thin films market as well as future process applications with 0.5 micron and below specifications.Documents
No documents