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TEL / TOKYO ELECTRON ALPHA-8SE
    Description
    The unit is fully functional and has PAC to prevent cracking.
    Configuration
    Refurbished by TEL in 2018 TEL Certified Used Tool Base unit ONO process. Quartz for Process & Loading Fixture Maintenance Fixture US Safety S2-93 ONO Process Specific Option -Integrated Gas System For ONO -2 NH3 Gas Line -1 DCS Gas Line -1 N2O Gas Line w/ PAC Unit -6 N2 Gas Line Thermal ALPHA-8SE Processing -Normal I/O Configuration -25 Wafers/Cassette without Notch Alignment -21 Cassette Loading Automation -8 inch Wafer Handling Capability -Wafer Load Automation -Wafer Counter -Auto Tube Shutter -Boat Elevator Cassette and Wafer Handling Automation -Power Supply Unit, Control Unit: 3-ph 480VAC, 1-ph 208VAC -Main Controller (WAVES) -Temperature Controller (Model 560) -VMN-40-101 500-1000C Cabinets/Units/Controllers -Furnace Cabinet (I Type Deep Bay Layout)
    OEM Model Description
    The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.
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    TEL / TOKYO ELECTRON

    ALPHA-8SE

    verified-listing-icon

    Verified

    CATEGORY
    Furnaces / Diffusion

    Last Verified: 21 days ago

    Key Item Details

    Condition:

    Refurbished


    Operational Status:

    Unknown


    Product ID:

    103893


    Wafer Sizes:

    8"/200mm


    Vintage:

    Unknown

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    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusion
    Vintage: 2003Condition: Used
    Last Verified27 days ago

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    verified-listing-icon
    Verified
    CATEGORY
    Furnaces / Diffusion
    Last Verified: 21 days ago
    listing-photo-ea9f9ccac6684a4a90965f145a5fc3f0-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/77608/ea9f9ccac6684a4a90965f145a5fc3f0/d497add6e11f4c718778743df7b04539_08a1493132f44956b793b614bb8b66fd_mw.jpeg
    Key Item Details

    Condition:

    Refurbished


    Operational Status:

    Unknown


    Product ID:

    103893


    Wafer Sizes:

    8"/200mm


    Vintage:

    Unknown


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    The unit is fully functional and has PAC to prevent cracking.
    Configuration
    Refurbished by TEL in 2018 TEL Certified Used Tool Base unit ONO process. Quartz for Process & Loading Fixture Maintenance Fixture US Safety S2-93 ONO Process Specific Option -Integrated Gas System For ONO -2 NH3 Gas Line -1 DCS Gas Line -1 N2O Gas Line w/ PAC Unit -6 N2 Gas Line Thermal ALPHA-8SE Processing -Normal I/O Configuration -25 Wafers/Cassette without Notch Alignment -21 Cassette Loading Automation -8 inch Wafer Handling Capability -Wafer Load Automation -Wafer Counter -Auto Tube Shutter -Boat Elevator Cassette and Wafer Handling Automation -Power Supply Unit, Control Unit: 3-ph 480VAC, 1-ph 208VAC -Main Controller (WAVES) -Temperature Controller (Model 560) -VMN-40-101 500-1000C Cabinets/Units/Controllers -Furnace Cabinet (I Type Deep Bay Layout)
    OEM Model Description
    The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.
    Documents

    No documents

    Similar Listings
    View All
    TEL / TOKYO ELECTRON ALPHA-8SE

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