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OXFORD PLASMALAB 100
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    Plasmalab 100 ICP 380
    OEM Model Description
    The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small pieces
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    OXFORD

    PLASMALAB 100

    verified-listing-icon

    Verified

    CATEGORY

    PECVD
    Last Verified: Over 30 days ago
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    82606

    Wafer Sizes:

    8"/200mm

    Vintage:

    1994

    Have Additional Questions?
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    Available
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    OXFORD

    PLASMALAB 100

    verified-listing-icon

    Verified

    CATEGORY

    PECVD
    Last Verified: Over 30 days ago
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    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    82606

    Wafer Sizes:

    8"/200mm

    Vintage:

    1994

    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    Plasmalab 100 ICP 380
    OEM Model Description
    The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small pieces
    Documents

    No documents

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